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AssigneeCarl Zeiss SMT GmbH
InventorsMarkus Deguenther, Paul Graeupner, Juergen Fischer
Estimating the term…
An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.
An illumination system having an optical axis and a pupil surface, the illumination system comprising:
An illumination system, comprising:
An illumination system, comprising:
Dependencies are inferred from the claim text.