Off-axis light source, light screen plate, and method of defining different types of patterns with single exposure
AssigneePowership Semiconductor Corp.
InventorYi-Shiang Chang
Life of this patent
Estimating the term…
Abstract
An off-axis light source is described, including an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern at the illumination surface thereof, wherein the illumination area of the quadrupole illumination pattern is smaller than that of the X- or Y-dipole illumination pattern. A light screen plate is also described, having corresponding openings therein and can be used to form the above off-axis light source. A method of defining different types of patterns with a single exposure is also described, which utilizes the above off-axis light source.
Claims14
An off-axis light source, comprising an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern at an illumination surface thereof, wherein an illumination area of the quadrupole illumination pattern is smaller than an illumination area of the X- or Y-dipole illumination pattern.
A light screen plate for forming an off-axis light source, comprising openings respectively corresponding to an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern, wherein a total area of the openings corresponding to the quadrupole illumination pattern is smaller than a total area of the openings corresponding to the X- or Y-dipole illumination pattern.
A method of defining different types of patterns with a single exposure, comprising performing exposure by using an off-axis light source and a single mask with the different types of patterns, wherein the off-axis light source comprises an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern on an illumination surface thereof, and an illumination area of the quadrupole illumination pattern is smaller than an illumination area of the X- or Y-dipole illumination pattern.
Dependencies are inferred from the claim text.