Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• a coating of a photocatalyst on a surface of a component of the lithographic apparatus, the surface being selected from the group comprising a surface:
• (i) of a sensor, wherein the lithographic apparatus is one in which, in use, the surface of the substrate available for exposure is entirely covered with immersion liquid during exposure and wherein the coating is at least 99 wt % photocatalyst;
• (ii) adjacent to an opening defined at least in part by the substrate table;
• (iii) of a shutter member configured to retain immersion liquid in contact with a final element of a projection system during substrate swap;
• (iv) of a substrate table, wherein the lithographic apparatus is one in which, in use, the surface of the substrate available for exposure is entirely covered with immersion liquid during exposure;
• (v) of a mask;
• (vi) of a fluid handling system wherein the surface is at least one of the group:
• a radially inward surface;
• a surface that defines a space, for immersion liquid;
• an upward facing surface, desirably radially inward;
• a radially outer lower surface;
• a lowermost undersurface with a single continuous coating without apertures;
• or the whole of the fluid handling system with a top and/or bottom with a portion with a lower contact angle;
• (vii) of a passageway to provide immersion fluid to a top surface of a substrate table;
• (viii) of a measurement stage;
• (ix) of a plan outer edge of a substrate table wherein a surface radially inward of the plan outer edge is different in having:
• no coating, a coating of different thickness, or a coating of different composition;
• (x) near or in an opening defined in or in part by a substrate table;
• or
• (xi) of a substrate support to support a substrate on a substrate table.