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US 2010/0060869 A1Published application
Lithographic apparatus and alignment method
AssigneeASML Netherlands B.V.
InventorsOleg Viacheslavovich Voznyi, Johannes Onvlee, Peter Ten Berge
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Abstract
An alignment method for a substrate or a patterning device is disclosed along with a corresponding apparatus. The method includes using a part of an alignment arrangement of a lithographic apparatus to undertake a part of an alignment procedure on a part of a substrate or on a part of a patterning device, until the substrate or a part of or in the lithographic apparatus, has become thermally stabilized within a limit.
Claims12
An alignment method for a substrate or a patterning device, the method comprising:
- using a part of an alignment arrangement of a lithographic apparatus to undertake a part of an alignment procedure on a part of a substrate or on a part of a patterning device, until the substrate or a part of or in the lithographic apparatus has become thermally stabilized within a limit.
A lithographic apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to impart a radiation beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
- an alignment arrangement configured to align a part of the substrate or a part of the patterning device, relative to a part of the lithographic apparatus;
- and
- an alignment arrangement controller configured to control a part of the alignment arrangement, the controller configured to control a part of the alignment arrangement in order to undertake a part of an alignment procedure on a part of a substrate or a part of the patterning device, until the substrate or a part of or in the lithographic apparatus, has become thermally stabilized within a limit.
3 more elements
Dependencies are inferred from the claim text.