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AssigneeASML Netherlands B.V.
InventorsGheorghe Tanasa, Nicolaas Ten Kate, Johannes Petrus Martinus Bernardus Vermeulen, Danny Maria Hubertus Philips, Maikel Adrianus Cornelis Schepers, Laurentius Johannes Adrianus Van Bokhoven
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A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.
A fluid handling structure configured to provide fluid to (i) a space between a projection system and a substrate and/or substrate table, and (ii) to a top surface of a substrate and/or substrate table radially outward of the space, the fluid handling structure comprising:
An immersion lithography apparatus in which, in use, substantially a whole of a top surface of a substrate table and a substrate is covered in fluid, the apparatus comprising a fluid handling structure configured to provide fluid to (i) a space between a projection system and a substrate and/or substrate table, and (ii) to a top surface of a substrate and/or substrate table radially outward of the space, the fluid handling structure comprising:
A device manufacturing method comprising projecting a beam of radiation onto a top surface of a substrate on a substrate table through immersion liquid which is provided to a space between a projection system and the substrate through a first opening of a fluid handling structure, wherein a barrier of the fluid handling structure resists flow of liquid out of the space between the fluid handling structure and the substrate and a second opening in the fluid handling structure provides fluid onto a top surface of the substrate and/or substrate table radially outward of the space.
Dependencies are inferred from the claim text.