Sputter-coating apparatus
AssigneeHon Hai Precision Industry Co., Ltd.
InventorHSIN-CHIN HUNG
Life of this patent
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Abstract
A sputter-coating apparatus is configured for coating a substrate with a target material, and includes an upper housing defining an opening, a lower housing, an infrared heating unit, and a shielding member. The lower housing and the upper housing cooperatively defines an airtight chamber. The substrate and the target material are positioned in the lower housing. The infrared heating unit is fixed to the upper housing and configured for heating the substrate. The shielding member is fixed to the upper housing to seal the opening and is transparent to infrared rays generated by the infrared heating unit.
Claims11
A sputter-coating apparatus for coating a substrate with a target material, comprising:
- an upper housing defining an opening;
- a lower housing, the lower housing and the upper housing cooperatively defining a airtight chamber, the substrate and the target material positioned in the lower housing;
- an infrared heating unit fixed to the upper housing and configured for heating the substrate;
- and
- a shielding member fixed to the upper housing to seal the opening, the shielding member being transparent to infrared rays generated by the infrared heating unit.
Dependencies are inferred from the claim text.