Photoresist supply apparatus and photoresist supply method

A photoresist supply apparatus, comprising:

• a discharge nozzle discharging a photoresist onto a wafer;
• a pump supplying the photoresist of a fixed quantity into the discharge nozzle;
• a trap tank temporarily storing the photoresist to be supplied from the pump to the discharge nozzle;
• a bottle containing the photoresist stored in the trap tank;
• a bubble discernment member determining whether bubbles exist in the standby photoresist to be supplied from the pump to the discharge nozzle;
• and
• a first drain line connecting the pump to a waste liquid tank to drain the standby photoresist from the pump to the waste liquid tank when the bubble discernment member checks the bubbles.

A photoresist supply method, comprising:

• temporarily storing a photoresist contained in a bottle in a trap tank;
• and
• performing a suction operation of a pump to fill a pump chamber of the pump with the photoresist stored in the trap tank, and performing a drain operation to supply the photoresist filled in the pump chamber into a discharge nozzle,
• wherein the performing of the suction and drain operations comprises comparing a measurement pressure value measuring an internal pressure of the pump with a reference pressure value before the photoresist filled in the pump chamber of the pump is supplied into the discharge nozzle to detect whether bubbles exist in the photoresist filled in the pump chamber of the pump.