Exposure aligning method and exposure apparatus
AssigneeNEC Electronics Corporation
InventorEiichirou Yamanaka
Life of this patent
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Abstract
In an exposure aligning method, a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position is determined and a second shift amount indicating a shift amount of the lower layer pattern in at lease one past lot which has been processed before said exposure target substrate is processed, from the origin point position is determined. A third shift amount indicating a difference between the first shift amount and the second shift amount is calculated and a first correction value is determined based on the third shift amount. An exposure position of an exposure target pattern is adjusted based on the first correction value.
Claims15
An exposure aligning method comprising:
- determining a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position;
- determining a second shift amount indicating a shift amount of the lower layer pattern in at lease one past lot which has been processed before said exposure target substrate is processed, from the origin point position;
- calculating a third shift amount indicating a difference between the first shift amount and the second shift amount;
- determining a first correction value based on the third shift amount;
- and
- adjusting an exposure position of an exposure target pattern based on the first correction value.
An exposure apparatus comprising:
- a storage unit;
- an exposure unit;
- a shift amount measuring unit configured to measure a first shift amount as a shift amount of a lower layer pattern of an exposure target substrate from an origin point position, and a second shift amount as a shift amount of the lower layer pattern in at lease one past lot which has been processed before said exposure target substrate is processed, from the origin point position, and to store in said storage unit;
- and
- an exposure alignment adjusting section configured to read out the first and second shift amounts to calculate a third shift amount indicating a difference between the first shift amount and the second shift amount, to determine a first correction value based on the third shift amount, and to adjust said exposure unit based on the first correction value so as to adjust an exposure position of an exposure target pattern.
A computer-readable recording medium in which a computer-readable program code is recorded to realize an exposure aligning method which comprises:
- determining a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position;
- determining a second shift amount indicating a shift amount of the lower layer pattern in at lease one past lot which has been processed before said exposure target substrate is processed, from the origin point position;
- calculating a third shift amount indicating a difference between the first shift amount and the second shift amount;
- determining a first correction value based on the third shift amount;
- and
- adjusting an exposure position of an exposure target pattern based on the first correction value.
Dependencies are inferred from the claim text.