Atomic layer deposition using metal amidinates

A compound represented by the general formula

• or oligomers thereof, wherein M is lithium or potassium, and wherein R1, R1′, R2, and R2′ independently represent alkyl groups, alkenyl groups, alkynyl groups, trialkylsilyl groups, or other non-metal atoms or groups that are not aryl, and R3 and R3′ independently represent hydrogen, alkyl groups, alkenyl groups, alkynyl groups, trialkylsilyl groups, or other non-metal atoms or groups that are not aryl, but excluding R3 and R3′ that are methyl, n-butyl, or tert-butyl when M is lithium and excluding the compound potassium N,N′-dimethylformamidine.

A process for depositing a material comprising a metal, M, the process comprising exposing a vapor of a first reagent to a substrate, wherein the reagent comprises a compound represented by the general formula

• or oligomers thereof, wherein M is selected from the metals copper, silver, gold, iridium, potassium, lithium, and sodium, and wherein R1, R1′, R2, and R2′ independently represent alkyl groups, aryl groups, alkenyl groups, alkynyl groups, trialkylsilyl groups, fluoroalkyl groups, or other non-metal atoms or groups, and R3 and R3′ independently represent hydrogen, alkyl groups, aryl groups, alkenyl groups, alkynyl groups, trialkylsilyl groups, fluoroalkyl group or other non-metal atoms or groups.