Wiring substrate and method of manufacturing the same

Abstract

A method of manufacturing a wiring substrate of the present invention, includes a step of forming a first wiring layer on an underlying layer, a step of forming a stacked body in which a protection layer is provided on an insulating layer, on the first wiring layer, a step of forming a via hole reaching the first wiring layer by processing the protection layer and the insulating layer, a step of roughening a side surface of the via hole by applying a desmear process to an inside of the via hole while using the protection layer as a mask, a step of removing the protection layer, and a step of forming a second wiring layer, which is connected to the first wiring layer via the via hole, on the insulating layer. The second wiring layer may be formed after the surface of the insulating layer is roughened, or the second wiring layer may be formed without roughening of the surface of the insulating layer.

Dependencies are inferred from the claim text.