Method of performing mask-writer tuning and optimization

A method of tuning a first mask writer unit utilizing a reference mask writer unit, said first mask writer unit and said reference mask writer unit each having tunable parameters for controlling mask writing performance, said method comprising the steps of:

• defining a test pattern and a mask writing model;
• generating said test pattern utilizing said reference mask writer unit and measuring the mask writing results;
• generating said test pattern utilizing said first mask writer unit and measuring the mask writing results;
• calibrating said mask writing model utilizing said mask writing results corresponding to said reference mask writer unit, said calibrated mask writing model having a first set of parameter values;
• tuning said calibrated mask writing model utilizing said mask writing results corresponding to said first mask writer unit, said tuned calibrated mask writing model having a second set of parameter values;
• adjusting said parameters of said first mask writer unit based on a difference between said first set of parameter values and said second set of parameter values.