Optical interconnection structure and method for manufacturing the same

A method for manufacturing an optical interconnection structure comprising:

• preparing a substrate on which a hole penetrating through a predetermined region is formed, the side wall of the hole being formed with a metal layer;
• disposing an optical guide member fixed to the inside of the hole of the substrate;
• and
• forming a metal oxide by oxidizing the metal layer and then fixing the optical guide member to the substrate by the metal oxide.

An optical interconnection structure comprising:

• a metal substrate;
• an optical guide member that is formed through which vertically penetrates a predetermined region of the metal substrate and is fixed by a metal oxidation film formed when the metal substrate is anodized;
• and
• an optical waveguide that is formed on the lower surface of the metal substrate including the oxidation film and is formed by stacking a lower cladding layer, a core layer, and an upper cladding layer.

A method for manufacturing an optical interconnection structure comprising:

• (a) preparing a metal substrate;
• (b) forming a hole that perpendicularly penetrates through the metal substrate on a predetermined region of the metal substrate;
• (c) inserting the optical guide member through a via hole and then forming an oxidation film by the anodization of the metal substrate to fix the optical guide member to the inside of the hole;
• and
• (d) removing the end of the optical guide member that is protruded into the upper and lower surfaces of the metal substrate including the oxidation film and then sequentially stacking a lower cladding layer, a core layer, and an upper cladding layer on the lower surface of the metal substrate including the oxidation film to form an optical waveguide.