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US 2009/0268189 A1Published application
Masks, lithography device and semiconductor component
AssigneeCarl Zeiss SMT GmbH
InventorsHans-Juergen MANN, Martin Lowisch, Wolfgang Singer
Life of this patent
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Abstract
One problem of projection optics concerns pupil apodization which leads to imaging defects. As here proposed, the illumination system is configured to illuminate the mask inhomogeneously. As a result, inhomogeneities in reflectivity caused by the mask itself are at least partly counteracted. This compensation not only makes the apodization over the pupil become more symmetric but also makes the intensity variation smaller overall.
Claims15
A lithography device comprising:
- an illumination system outputting an illumination light;
- a mask having a reflectivity that varies in accordance with an angle of incidence of the illumination light on the mask, the mask thereby reflecting light with angle-dependent variations;
- and
- a projection system receiving the light reflected by the mask;
- wherein an intensity distribution of the illumination light is adjusted over the angle of incidence by the illumination system to at least partly counteract the angle-dependent variations of the light reflected by the mask.
2 more elements
A lithography device comprising:
- an illumination system;
- a mask;
- and
- a projection system,
- wherein the illumination system is configured to illuminate the mask inhomogeneously, so that pupil apodization effects are at least partly compensated.
2 more elements
Dependencies are inferred from the claim text.