Measurement method and exposure apparatus

A method of measuring an optical characteristic of an optical system using a measurement apparatus, the method comprising the steps of:

• determining a position of each of object points by arranging, on a side of an object plane of the optical system, an object point measurement device array in which a plurality of object point measurement devices are arranged, and sequentially inserting the plurality of object point measurement devices in an optical path;
• determining a position of each of image points by arranging, on a side of an image plane of the optical system, an image point measurement device array in which a plurality of image point measurement devices are arranged, and sequentially inserting the plurality of image point measurement devices in the optical path;
• calculating an error attributed to the measurement apparatus based on the positions of object points and the positions of the image points;
• obtaining a measured value by measurement to obtain information representing the optical characteristic of the optical system using the measurement apparatus;
• and
• correcting the measured value based on the error.