Exposure apparatus, movable body drive system, pattern formation apparatus, and exposure method, and device manufacturing method
AssigneeNikon Corporation
InventorYuichi Shibazaki
Life of this patent
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AssigneeNikon Corporation
InventorYuichi Shibazaki
Estimating the term…
While a wafer stage moves linearly in a Y-axis direction, surface position information of a wafer surface at a plurality of detection points set at a predetermined interval in an X-axis direction is detected by a multipoint AF system, and by a plurality of alignment systems arranged in a line along the X-axis direction, marks at different positions on the wafer are each detected, and a part of a chipped shot of the wafer is exposed by a periphery edge exposure system. This allows throughput to be improved when compared with the case when detection operation of the marks, detection operation of the surface position information (focus information), and periphery edge exposure operation are performed independently.
An exposure apparatus that exposes an object with an exposure beam, the apparatus comprising:
9-85. (canceled)
An exposure apparatus that exposes an object with an exposure beam, the apparatus comprising:
An exposure apparatus that exposes an object with an energy beam and forms a pattern on the object, the apparatus comprising:
An exposure apparatus that exposes an object with an energy beam and forms a pattern on the object, the apparatus comprising:
An exposure apparatus that exposes an object with an energy beam and forms a pattern on the object, the apparatus comprising:
A movable body drive system which drives a movable body substantially along a predetermined plane, the system comprising:
An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:
An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:
An exposure method in which an object is exposed with an exposure beam, the method comprising:
An exposure method in which an object is exposed with an exposure beam, the method comprising:
An exposure method in which an object is exposed with an energy beam and a pattern is formed on the object, the method comprising:
An exposure method in which an object is exposed with an energy beam and a pattern is formed on the object, the method comprising:
An exposure method in which an object is exposed with an energy beam, the method comprising:
An exposure method in which an object is exposed with an energy beam, the method comprising:
Dependencies are inferred from the claim text.