Dual-face fluid components
AssigneeCommissariat a l'Energie Atomique
InventorsPatrick Pouteau, Raymond Campagnolo, Martine Cochet
Life of this patent
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Abstract
A fluid component includes at least one substrate of a material that can be etched and an etch stop layer for said material means for detecting the properties of a fluid and/or for activating said fluid and provided on a first side of said etch stop layer and means for receiving said fluid, formed in the substrate and provided on the second side of the etch stop layer.
Claims27
Fluid component comprising:
- at least one substrate of a material that can be etched, and a stop layer for etching of said material,
- means for detecting properties of a fluid and/or for activating said fluid, formed on a first side of said etch stop layer,
- a fluidic part to receive said fluid, formed in the substrate, on a second side of the etch stop layer.
Method of forming at least one fluid component comprising:
- a) the selection of a substrate of a material that can be etched, provided with an etch stop layer for said material, formed integrally with said substrate,
- b) the formation of means for detecting properties of a fluid and/or for activating said fluid, on a first side of said etch stop layer,
- c) the formation of a fluidic part to receive said fluid, in the substrate, by etching of said substrate from the second side of the etch stop layer and stopping the etching on this stop layer,
- d) the transfer and the sealing of a cap to close the fluidic part.
Method according to claim 26, wherein step a) is following by a step of forming a passivation layer before carrying out step b).
Dependencies are inferred from the claim text.