Method of manufacturing vertical magnetic head

A method of manufacturing a vertical magnetic head,

• comprising the steps of:
• forming a resist pattern including a concave section, whose planar shape corresponds to that of a main magnetic pole to be formed, on a wafer substrate;
• laminating a plurality of films in the concave section until forming a prescribed multilayer structure of the main magnetic pole;
• and
• removing the resist pattern after laminating the films,
• wherein inner faces of the concave section are perpendicular to a surface of the wafer substrate in said forming step,
• said laminating step includes the sub-steps of:
• (a) performing a sputtering process, in which particles are perpendicularly sputtered with respect to the surface of the wafer substrate, a prescribed number of times so as to flatly laminate the sputtered films in the concave section;
• and
• (b) removing the sputtered films, which have been stuck on a surface of the resist pattern in the sub-step (a), from the surface of the resist pattern by an abrasive process, and
• the sub-steps (a) and (b) are repeated, in said laminating step, until the prescribed multilayer structure is formed.