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US 2009/0261065 A1Published application
Components for use in a plasma chamber having reduced particle generation and method of making
AssigneeLam Research Corporation
InventorsHARMEET SINGH, John Daugherty, Vahid Vahedi, Hong Shih
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Abstract
Components entirely of ceramic with etched surfaces wherein the etched surface has a surface roughness value or at least about 100 microinches (about 2.54 microns) Ra, and methods of forming such.
Claims20
A component for use in a plasma chamber comprising:
- a component entirely of a ceramic material, the component having a surface roughness value of at least about 100 microinches (about 2.54 microns) Ra produced by mechanical roughening and acid etching.
A method of forming a component with an etched surface, comprising:
- etching with hydrochloric acid the surface of a sintered component formed entirely of yttria to create an etched surface,
- wherein the etched surface has a surface roughness value of at least about 100 microinches (about 2.54 microns) Ra.
Dependencies are inferred from the claim text.