Processing system, processing method and recording medium
AssigneeTokyo Electron Limited
InventorJiro Higashijima
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AssigneeTokyo Electron Limited
InventorJiro Higashijima
Estimating the term…
A lid 81 included in a processing vessel 30 is held by a simple mechanism to prevent the leakage of an atmosphere in a processing space 83 formed in the processing vessel 30 into an environmental space. A low-pressure space 84 surrounds the processing space 83 formed in the processing vessel 30. The processing vessel 30 is provided with a first sealing member 101 sealing a joint between a part of a vessel body 80 and a part of the lid 81 to separate the low-pressure apace 84 from the processing space 83, and a second sealing member 102 sealing a joint between a part of the vessel body 80 and a part of the lid 81 on the outer side of the first sealing member 101 to separate the low-pressure space from an external space surrounding the processing vessel 30. Pressure in the low-pressure space 84 is adjusted such that pressure in the processing space 83 is equal to or lower than pressure in the external space outside the processing vessel 30 in an internal leakage state where the first sealing member 101 permits leakage and the second sealing member 102 is in a sealing condition.
A processing system comprising:
A processing method of processing a workpiece placed in a processing space defined by a processing vessel, said processing method comprising the steps of:
A recording medium storing a program for a computer for controlling a processing system to execute to control the processing system to carry out a processing method of processing a workpiece placed in a processing space defined by a processing vessel, wherein said processing method comprises the steps of:
Dependencies are inferred from the claim text.