Substrate Cleaning System, Substrate Cleaning Method, Subtrate Cleaning Program, and Program Recording Medium

A substrate cleaning system comprising cleaning devices for cleaning a substrate and a controller for controlling the driving of the cleaning devices in accordance with driving recipes predetermined,

• wherein the controller
• prioritizes the cleaning devices;
• sets, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, an interference region in which the cleaning device having the higher priority and the cleaning device having the lower priority can interfere with each other;
• makes the cleaning device having the higher priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate;
• keeps the cleaning device having the lower priority waiting in a predetermined waiting position;
• and
• moves the cleaning device having the lower priority from the waiting position when or after the cleaning device having the higher-priority has come out of the interference region, and makes the cleaning device having the lower priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate.

A substrate cleaning method of cleaning substrates by controlling the driving of cleaning devices in accordance with driving recipes predetermined, comprising the steps of:

• prioritizing the cleaning devices;
• calculating, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, a time in which the cleaning device having the higher priority and the cleaning device having the lower priority can interfere with each other, and setting the calculated time as a waiting time;
• making the cleaning device having the higher priority start cleaning a substrate from a predetermined cleaning-starting position towards periphery of the substrate;
• keeping the cleaning device having the lower priority waiting in a predetermined waiting position;
• and
• moving the cleaning device having the lower priority from the waiting position when or after the waiting time has elapsed since the cleaning device having the higher priority started cleaning, and making the cleaning device having the lower priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate.

A substrate cleaning method of cleaning substrates by controlling the driving of cleaning devices in accordance with driving recipes predetermined, comprising the steps of:

• prioritizing the cleaning devices;
• setting, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, an interference region in which the cleaning device having the higher priority and the cleaning device having the lower priority can interfere with each other;
• making the cleaning device having the higher priority start cleaning a substrate from a predetermined cleaning-starting position towards periphery of the substrate;
• keeping the cleaning device having the lower priority waiting in a waiting position outside the interference region;
• and
• moving the cleaning device having the lower priority from the waiting position when or after the cleaning device having the higher priority has come out of the interference region, and making the cleaning device having the lower priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate.

A substrate cleaning program with which a substrate cleaning system comprising cleaning devices for cleaning a substrate, in which the driving of the cleaning devices is controlled in accordance with driving recipes predetermined, carries out cleaning operation, the substrate cleaning program comprising:

• prioritizing step of prioritizing the cleaning devices;
• setting waiting time step of calculating, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, the a time in which the cleaning device having the higher priority and the cleaning device having the lower priority can interfere with each other, and setting the calculated time as a waiting time;
• starting higher priority cleaning device step of making the cleaning device having the higher priority start cleaning a substrate from a predetermined cleaning-starting position towards periphery of the substrate;
• keeping lower priority cleaning device waiting step of keeping the cleaning device having the lower priority waiting in a predetermined waiting position;
• and
• starting lower priority cleaning device step of moving the cleaning device having the lower priority from the waiting position when or after the waiting time has elapsed since the cleaning device having the higher priority started cleaning, and making the cleaning device having the lower priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate.

A substrate cleaning program with which a substrate cleaning system comprising cleaning devices for cleaning a substrate, in which the driving of the cleaning devices is controlled in accordance with driving recipes predetermined, carries out cleaning operation, the substrate cleaning program comprising:

• prioritizing step of prioritizing the cleaning devices;
• setting interference region step of setting, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, an interference region in which the cleaning device having the higher priority and the cleaning device having the lower priority can interfere with each other;
• starting higher priority cleaning device step of making the cleaning device having the higher priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate;
• keeping lower priority, cleaning device waiting step of keeping the cleaning device having the lower priority waiting in a waiting position outside the interference region;
• and
• starting lower priority cleaning device step of moving the cleaning device having the lower priority from the waiting position when or after the cleaning device having the higher priority has come out of the interference region and making the cleaning device having the lower priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate.

A program recording medium in which a substrate cleaning program with which a substrate cleaning system comprising cleaning devices for cleaning a substrate, in which the driving of the cleaning devices is controlled in accordance with driving recipes predetermined, carries out cleaning operation is recorded,

• the substrate cleaning program comprising:
• prioritizing step of prioritizing the cleaning devices;
• setting waiting time step of calculating, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, a time in which the cleaning device having the higher priority and the cleaning device having the lower priority can interfere with each other, and setting the calculated time as a waiting time;
• starting higher priority cleaning device step of making the cleaning device having the higher priority start cleaning a substrate from a predetermined cleaning-starting position towards periphery of the substrate;
• keeping lower priority cleaning device waiting step of keeping the cleaning device having the lower priority waiting in a predetermined waiting position;
• and
• starting lower priority cleaning device step of moving the cleaning device having the lower priority from the waiting position when or after the waiting time has elapsed since the cleaning device having the higher priority started cleaning, and making the cleaning device having the lower priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate.

A program recording medium in which a substrate cleaning program with which a substrate cleaning system comprising cleaning devices for cleaning a substrate, in which the driving of the cleaning devices is controlled in accordance with driving recipes predetermined, carries out cleaning operation is recorded,

• the substrate cleaning program comprising:
• prioritizing step of prioritizing the cleaning devices;
• setting interference region step of setting, on the basis of a driving recipe for a cleaning device having a higher priority and a driving recipe for a cleaning device having a lower priority, an interference region in which the cleaning device having the higher priority and the cleaning device having the lower priority can interfere with each other;
• starting higher priority cleaning device step of making the cleaning device having the higher priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate;
• keeping lower priority cleaning device waiting step of keeping the cleaning device having the lower priority waiting in a waiting position outside the interference region;
• and
• starting lower priority cleaning device step of moving the cleaning device having the lower priority from the waiting position when or after the cleaning device having the higher priority has come out of the interference region and making the cleaning device having the lower priority start cleaning the substrate from a predetermined cleaning-starting position towards periphery of the substrate.