Device and method for patterning structures on a substrate

A device for patterning structures on a substrate, the device comprising:

• an Atomic Force Microscope having at least one scanning tip;
• a light emitting device;
• a space being filled with a vapour of a material suitable for deposition onto said substrate in a Chemical Vapour Deposition process when decomposed;
• and
• an electromagnetic field being strong enough around said scanning tip to decompose said vapour around said scanning tip,
• wherein said light emitting device is to emit a light beam causing said electromagnetic field around said scanning tip, said light beam having an intensity that is not capable to decompose the vapour in areas other than around said scanning tip.