Method for Fabricating A Flat Panel Display

A method for fabricating a flat panel display, the flat panel display comprising a plurality of sub-pixels, the method comprising:

• providing a substrate;
• forming an amorphous silicon layer on the substrate;
• performing a first crystallization process to re-crystallize the amorphous silicon layer so that the amorphous silicon layer becomes a polysilicon layer;
• forming a patterned absorbing layer to cover an active area pattern of a driving thin film transistor (TFT) in each of the sub-pixels and to expose portions of the polysilicon layer;
• performing a second crystallization process to re-crystallize the exposed portions of the polysilicon layer so that the grain structure of the exposed portions of the polysilicon layer is different from the grain structure of a plurality of active areas covered by the active area patterns of the driving TFTs;
• removing the patterned absorbing layer;
• and
• removing portions of the polysilicon layer to form the active area of the driving TFT and to form an active area of a switching TFT in the exposed portions of the polysilicon layer of each sub-pixel;
• wherein each of the active areas comprises a channel region, a source region, and a drain region.