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US 2009/0214979 A1Published application
Photosensitive resin composition and photosensitive element
AssigneeHitachi Chemical Company, Ltd.
InventorsKen Sawabe, Takeshi Nojiri
Life of this patent
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Abstract
A photosensitive resin composition comprising (a) a compound obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, and (b) a 1,2-quinonediazide compound. The photosensitive resin composition, which comprises component (b) composed of a 1,2-quinonediazide compound in combination with a component (a) obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, exhibits sufficiently high photosensitivity, image contrast, resolution and adhesiveness.
Claims10
A photosensitive resin composition comprising
- (a) a compound obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, and
- (b) a 1,2-quinonediazide compound.
Dependencies are inferred from the claim text.