Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorKazuhiko Mishima
Life of this patent
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Abstract
An exposure apparatus includes a plurality modules and a controller, each module exposes a pattern of an original onto a substrate by using light from a light source, wherein each module includes a position detector configured to detect a position of the original or the substrate that has an alignment mark used for an alignment between the original and each shot on the substrate, wherein the controller has information relating to an alignment error of a detection result by the position detector which is set to each module, and wherein the exposure apparatus further includes a reducing unit configured to reduce a difference of the alignment error among modules.
Claims13
An exposure apparatus comprising:
- a plurality modules that each include a position detector;
- a controller;
- and
- a reducing unit,
- wherein each module exposes a pattern of an original onto a substrate by using light from a light source,
- wherein the position detectors are configured to detect a position of the original or the substrate that has an alignment mark used for an alignment between the original and each shot on the substrate,
- wherein the controller has information relating to an alignment error of a detection result by the position detector which is set to each module, and
- wherein the reducing unit is configured to reduce a difference of the alignment error among modules.
An exposure apparatus configured to expose a pattern of an original onto a substrate by utilizing light from a light source, the exposure apparatus comprising:
- a plurality of movable stages each mounted with the original or substrate;
- a plurality of interferometers configured to detect positions of the plurality of stages;
- and
- a reducing unit configured to reduce an environmental deviation of a wavelength of the light used for each of the plurality of interferometers.
A device manufacturing method utilized in an exposure apparatus that includes a plurality modules that each include a position detector;
- a controller;
- and a reducing unit, wherein each module exposes a pattern of an original onto a substrate by using light from a light source, wherein the position detectors are configured to detect a position of the original or the substrate that has an alignment mark used for an alignment between the original and each shot on the substrate, wherein the controller has information relating to an alignment error of a detection result by the position detector which is set to each module, and wherein the reducing unit is configured to reduce a difference of the alignment error among modules, the method comprising:
- exposing a substrate utilizing the exposure apparatus;
- and
- developing the substrate that has been exposed.
Dependencies are inferred from the claim text.