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US 2009/0214761 A1Published application
Real time imprint process diagnostics for defects
AssigneesMolecular Imprints, Inc., Board of Regents, The University of Texas System
InventorsSidlgata V. Sreenivasan, Shrawan Singhal, Byung-Jin Choi
Life of this patent
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Abstract
Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.
Claims22
A method comprising:
- positioning a first template and a substrate within an imprint lithographic system to define a volume therebetween;
- dispensing polymerizable material on the substrate;
- solidifying the polymerizable material to define a patterned layer on the substrate;
- identifying the position of at least one transition zone in the patterned layer, the patterned layer including a residual layer having a magnitude of thickness;
- determining a region of interest on the first template based on the position of the transition zone;
- unloading the first template from the imprint lithographic system;
- and,
- inspecting the region of interest for defects.
5 more elements
A method comprising:
- loading a first template in an imprint lithography system, the first template being positioned to define a volume between the first template and a first substrate;
- patterning polymerizable material between the first template and the first substrate to provide a patterned layer, the patterned layer having a residual layer and a plurality of features;
- identifying an exclusion zone and a transition zone in the patterned layer;
- determining a region of interest on the first template, the region of interest corresponding to the exclusion zone and the transition zone in the patterned layer;
- removing the first template from the imprint lithography system;
- loading a second template into the imprint lithography system;
- patterning polymerizable material between the second template and a second substrate;
- removing a defect from the first template;
- and,
- unloading the second template from the imprint lithography system and reloading the first template.
7 more elements
A method comprising:
- positioning a first template and a substrate within an imprint lithographic system to define a volume therebetween;
- dispensing polymerizable material on the substrate;
- solidifying the polymerizable material to define a patterned layer on the substrate;
- identifying the position of at least one transition zone in the patterned layer, the patterned layer including a residual layer having a magnitude of thickness;
- determining a region of interest on the first template based on the position of the transition zone;
- unloading the first template from the imprint lithographic system;
- and,
- identifying and defects within the region of interest;
- determining acceptability of the defect and ability of the defect to be repaired.
- selecting, based on the acceptability of the defect and the ability of the defect to be repaired, one of:
- repairing the defect and reloading the first template,
- reloading the first template without repairing the defect, or
- discarding the template.
10 more elements
Dependencies are inferred from the claim text.