Measurement method and measurement reticle

A measurement method of measuring a wavefront aberration of an optical system to be measured using a measurement reticle including a wavefront measurement mark and a pinhole to make light from the wavefront measurement mark impinge on different positions on a pupil plane of the optical system to be measured, the method comprising:

• arranging the measurement reticle on an object plane of the optical system to be measured;
• forming an image of the wavefront measurement mark on an image plane of the optical system to be measured;
• and
• calculating the wavefront aberration of the optical system to be measured based on a position shift amount of the image of the wavefront measurement mark from an ideal position, the image being formed on the image plane of the optical system to be measured,
• wherein the wavefront measurement mark includes a first mark having a longitudinal direction in a first direction, and a second mark having a longitudinal direction in a second direction perpendicular to the first direction and spaced apart from the first mark.