Illumination optical system, exposure apparatus using the same and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorKazuhiko Kajiyama
Life of this patent
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Abstract
An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions, an aperture stop arranged perpendicular to the generating line direction, and a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.
Claims7
An illumination optical system comprising:
- a pair of fly-eye mirrors configured to receive light from a light source;
- a first condenser configured to condense light from the pair of fly-eye mirrors;
- a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions;
- an aperture stop arranged perpendicular to the generating line direction;
- and
- a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.
An exposure apparatus configured to exposure a pattern of an original onto a substrate, the exposure apparatus comprising:
- an illumination optical system configured to illuminate an original by using light from a light source;
- wherein the illumination optical system includes:
- a pair of fly-eye mirrors configured to receive light from a light source;
- a first condenser configured to condense light from the pair of fly-eye mirrors;
- a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions;
- an aperture stop arranged perpendicular to the generating line direction;
- and
- a second condenser configured to superpose on an illuminated surface of the original luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.
A device manufacturing method comprising the steps of:
- exposing a substrate by using an exposure apparatus;
- and
- developing the substrate that has been exposed,
- wherein the exposure apparatus includes:
- an illumination optical system configured to illuminate an original by using light from a light source;
- and
- a pair of fly-eye mirrors configured to receive light from a light source;
- a first condenser configured to condense light from the pair of fly-eye mirrors;
- a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions;
- an aperture stop arranged perpendicular to the generating line direction;
- and
- a second condenser configured to superpose on an illuminated surface of the original luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.
Dependencies are inferred from the claim text.