US 2009/0213348 A1Published application

Exposure apparatus

AssigneeCanon Kabushiki Kaisha

InventorMichio Kono

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Abstract

A scanning exposure apparatus has plural projection optical systems having plural mirrors configured to form an optical-axis shift vector. Its component in a direction orthogonal to a scanning direction is set so that adjacent areas in plural areas on the original can adjoin each other when viewed from the direction orthogonal to the scanning direction and adjacent areas in plural areas on the substrate can adjoin each other when viewed from the direction. A size of its component in the scanning direction is set so that a product between the imaging magnification of each projection optical system and a distance between centers of two areas on the original in the scanning direction corresponding to two projection optical systems in the plurality of projection optical systems can be equal to a distance between centers of two areas on the substrate corresponding to the two projection optical systems in the scanning direction.

Claims17

Dependent claims

An exposure apparatus configured to expose a plurality of areas on an original onto a substrate by synchronously scanning the original and the substrate, the exposure apparatus comprising a plurality of projection optical systems each having an imaging magnification of an equal enlargement or reduction, and each projection optical system forming an intermediate image of the pattern of the original and projecting an erect image of the pattern of the original onto the substrate,

wherein each projection optical system includes:
a plurality of mirrors configured to form an optical-axis shift vector that has a start point that is a point on the substrate at which an optical axis of the projection optical system on an original side intersects with the substrate, and an end point that is a point on the substrate at which an optical axis of the projection optical system on a substrate side intersects with the substrate;
and
a movement unit configured to move the plurality of mirrors so that the optical-axis shift vector has a component in a direction orthogonal to a scanning direction which enables adjacent areas in the plurality of areas on the original to adjoin each other when viewed from the direction orthogonal to the scanning direction and enables adjacent areas in the plurality of areas on the substrate to adjoin each other when viewed from the direction orthogonal to the scanning direction, and configured to move the plurality of mirrors so that the optical-axis shift vector has a component in a scanning direction which enables a product between the imaging magnification of each projection optical system and a distance between centers of two areas on the original in the scanning direction corresponding to two adjacent projection optical systems in the plurality of projection optical systems to be equal to a distance between centers of two areas on the substrate in the scanning direction corresponding to the two adjacent projection optical systems.

1 more element

An exposure method configured to expose a plurality of areas on an original onto a substrate via a plurality of projection optical systems each having an imaging magnification of an equal enlargement or reduction, each projection optical system forming an intermediate image of the pattern of the original and projecting an erect image of the pattern of the original onto the substrate, each projection optical system including a plurality of mirrors configured to form an optical-axis shift vector that has a start point that is a point on the substrate at which an optical axis of the projection optical system on an original side intersects with the substrate, and an end point that is a point on the substrate at which an optical axis of the projection optical system on a substrate side intersects with the substrate, the exposure method comprising:

moving the plurality of mirrors so that the optical-axis shift vector has a component in a direction orthogonal to a scanning direction which enables adjacent areas in the plurality of areas on the original to adjoin each other when viewed from the direction orthogonal to the scanning direction and enables adjacent areas in the plurality of areas on the substrate to adjoin each other when viewed from the direction orthogonal to the scanning direction, and moving the plurality of mirrors so that the optical-axis shift vector has a component in the scanning direction which enables a product between the imaging magnification of each projection optical system and a distance between centers of two areas on the original in the scanning direction corresponding to two adjacent projection optical systems in the plurality of projection optical systems to be equal to a distance between centers of two areas on the substrate in the scanning direction corresponding to the two adjacent projection optical systems;
and
exposing the pattern of the original onto the substrate by synchronously scanning the original and the substrate while the plurality of mirrors have been moved.

Dependencies are inferred from the claim text.