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US 2009/0212012 A1Published application
Critical dimension control during template formation
AssigneeMolecular Imprints, Inc.
InventorsCynthia B. Brooks, Dwayne L. LaBrake, Niyaz Khusnatdinov, Michael N. Miller, Sidlgata V. Sreenivasan, David James Lentz, Frank Y. Xu
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Abstract
Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer.
Claims20
A method comprising:
- positioning an imprint lithography mold in superimposition with a substrate to define a volume;
- dispensing polymerizable material within the volume;
- solidifying the polymerizable material to form a patterned layer having a residual layer and a plurality of features, the features having a critical dimension;
- determining a magnitude of thickness of the residual layer and a desired critical dimension for the features;
- applying a first etching composition to the patterned layer based on the magnitude of the thickness of the residual layer to alter the critical dimension of the features to the desired critical dimension;
- and,
- applying a second etching composition to the patterned layer to transfer the features into the substrate.
4 more elements
A method comprising:
- positioning an imprint lithography mold and a substrate in superimposition to define a volume therebetween;
- dispensing a first polymerizable material on the substrate;
- dispensing a second polymerizable material on the substrate, the first polymerizable material having a first erosion rate that is greater than the second polymerizable material;
- solidifying the first polymerizable material and the second polymerizable material to form a patterned layer having a residual layer and a plurality of features, wherein a critical dimension of features is substantially uniform.
1 more element
A method comprising,
- positioning an imprint lithography mold in superimposition with a substrate to define a volume;
- dispensing polymerizable material within the volume;
- solidifying the polymerizable material to form a patterned layer having a residual layer and a plurality of features, the features having a critical dimension;
- determining a magnitude of thickness of the residual layer;
- and,
- applying a first etching composition to the patterned layer based on the magnitude of the thickness of the residual layer such that the residual layer thickness is proportional to the critical dimension.
3 more elements
Dependencies are inferred from the claim text.