Apparatus for gas distribution and its applications

A semiconductor processing system, comprising:

• a processing chamber casing with a lid;
• a gas distribution apparatus disposed in said processing chamber and connected to said processing chamber utilized for gas distribution, said gas distribution apparatus comprising:
• a top dome-cover having a first gas inlet and a second gas inlet for the gas communication;
• a first gas distribution plate disposed below said top dome-cover and a first gas buffer cavity formed between said top dome-cover and said first gas distribution plate, said first gas distribution plate comprises:
• a plurality of first channels arranged on said first gas distribution plate at the opposite surface of said first gas buffer cavity and intersecting each other to define a plurality of first island protrusions;
• and
• a plurality of first bypass through holes arranged within said first island protrusions;
• and
• a bottom plate disposed below said first gas distribution plate, wherein
• a second gas buffer cavity is formed at said first channels between said bottom plate and said first gas distribution plate;
• a plurality of first through holes are arranged on said bottom plate;
• and
• said first through holes are aligned at all said first bypass through holes and said second gas buffer cavity;
• and
• a susceptor disposed below said gas distribution apparatus and adapted for supporting a plurality of substrates thereon.

A gas distribution showerhead comprising:

• a first gas distribution plate having a plurality of first channels arranged intersecting each other to define a plurality of first island protrusions thereon, wherein a plurality of first bypass through holes arranged within said first island protrusions;
• a fluid distribution plate disposed below said first gas distribution plate having a plurality of second channels arranged thereon at the bottom surface and intersecting each other to define a plurality of second island protrusions, wherein a plurality of second bypass through holes formed within said second island protrusions to align with each said first bypass through holes and connect with said first channels;
• a bottom plate disposed below said fluid distribution plate and having a plurality of first through holes thereon, wherein said first through holes are aligned with all said second bypass through hole;
• and
• a cooling system having a fluid circulating from a fluid inlet to said second channels of said fluid distribution plate and to a fluid outlet to cool down said gas distribution showerhead.