Back to results
US 2009/0156453 A1Published application
Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
AssigneeAvantor Performance Materials, Inc.
InventorSeiji Inaoka
Life of this patent
Estimating the term…
Abstract
Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor polymer having multiple hydroxyl- or amino-functional groups pendant from the polymer backbone.
Claims41
A non-aqueous cleaning composition for cleaning photoresist and residues from microelectronic substrates, said cleaning composition comprising:
- one or more polar organic solvents,
- one or more organic hydroxylated amines,
- and a corrosion inhibiting amount of one or more corrosion inhibitor polymer having multiple functional groups pendant from the polymer backbone and wherein the functional pendant groups are selected from amino and hydroxyl groups.
Dependencies are inferred from the claim text.