Resist composition and process for producing same
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsToru Miyano, Ryusaku Takahashi, Motoko Samezawa, Masaaki Muroi, Koji Kanno
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Abstract
A resist composition that includes an organic solvent (S) and a base material component dissolved in the organic solvent (S), wherein the organic solvent (S) contains ethyl lactate and an antioxidant, and the concentration of the antioxidant within the organic solvent (S) is 10 ppm or greater.
Claims6
A resist composition comprising an organic solvent (S), and a base material component dissolved in said organic solvent (S), wherein said organic solvent (S) comprises ethyl lactate and an antioxidant, and a concentration of said antioxidant within said organic solvent (S) is 10 ppm or greater.
A process for producing a resist composition, comprising the steps of:
- preparing an organic solvent (S) using ethyl lactate that comprises an antioxidant, so that a concentration of said antioxidant within said organic solvent (S) is 10 ppm or greater, and dissolving a base material component in said organic solvent (S).
Dependencies are inferred from the claim text.