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AssigneeInternational Business Machines Corporation
InventorsMICHAEL P. BELYANSKY, OLEG GLUSCHENKOV
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A method provides an etching ambient environment within an ultraviolet curing chamber and can optionally also generate an electrical discharge in the chamber. The method also irradiates the substrate with ultraviolet radiation. The providing of the etching ambient environment, the generating of the electrical discharge, and the irradiating can be performed simultaneously. Alternatively, the providing of the etching ambient environment and the generating of the electrical discharge can be used as a pre-treatment and performed before the irradiating. The etching ambient environment and the generating of the electrical discharge can be provided in such concentrations that the etching ambient environment removes hydrogen and/or oxygen from the deposited thin film.
A method comprising:
A method comprising:
An apparatus comprising:
An apparatus comprising:
Dependencies are inferred from the claim text.