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US 2009/0153829 A1Published application
Lithographic projection objective
AssigneeCarl Zeiss SMT GmbH
InventorsOlaf Rogalsky, Boris Bittner, Thomas Petasch, Jochen Haeussler
Life of this patent
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Abstract
Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.
Claims39
A method, comprising:
- providing a projection objective of a lithography projection exposure apparatus, the projection objective comprising a plurality of optical elements between an object plane of the projection objective and an image plane of the projection objective, the plurality of optical elements comprising a first optical element having a refractive power, the first optical element being disposed in the projection objective at a first location;
- removing the first optical element from the projection objective;
- and
- inserting a first spare optical element into the projection objective at the first location,
- wherein the removing and inserting steps are performed at a location of use of the lithography projection exposure apparatus in a lithography process.
2 more elements
A method, comprising:
- providing a projection objective of a lithography projection exposure apparatus, the projection objective comprising a plurality of optical elements between an object plane of the projection objective and an image plane of the projection objective, the plurality of optical elements comprising a first optical element having a refractive power, the first optical element being disposed in the projection objective at a first location, the method comprising;
- removing the first optical element from the projection objective;
- inserting a first spare optical element into the projection objective at the first location;
- and
- after inserting the first spare optical element, adjusting an image quality of the projection objective to a desired quality.
2 more elements
A method, comprising:
- providing a projection objective of a lithography projection exposure apparatus, the projection objective comprising a plurality of optical elements between an object plane of the projection objective and an image plane of the projection objective, the plurality of optical elements comprising a first optical element having a refractive power, the first optical element being disposed in the projection objective at a first location, the method comprising;
- removing the first optical element from the projection objective;
- and
- inserting a first spare optical element into the projection objective at the first location,
- wherein the method is performed without exchanging all of the optical elements of the projection objective.
2 more elements
A method, comprising:
- providing a projection objective of a lithography projection exposure apparatus, the projection objective comprising a plurality of optical elements between an object plane of the projection objective and an image plane of the projection objective, the plurality of optical elements comprising a first optical element disposed in the projection objective at a first location, the method comprising;
- removing the first optical element from the projection objective;
- and
- inserting a first spare optical element into the projection objective at the first location,
- wherein the removing and inserting steps are performed at a location of use of the lithography projection exposure apparatus in a lithography process.
2 more elements
Dependencies are inferred from the claim text.