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AssigneesASML Netherlands B.V., ASML Holding N.V.
InventorsHarry Sewell, Jozef Petrus Henricus Benschop
Estimating the term…
A multiple patterning process employs a phase change material, portions of which can be converted to an amorphous state and then a remaining portion is selectively removed to provide high resolution pattern features with a feature spacing smaller than, for example, a minimum spacing available in a conventional patterning layer employing a single exposure. A lithographic apparatus for use in the process may comprise an exposure tool having a single illuminator and single patterning device that is imaged through a single exposure slit onto a scanning substrate. Alternatively, the exposure tool may have multiple illuminators and/or multiple scanning complementary patterning devices optionally used with multiple exposure slits on the scanning substrate to facilitate double patterning in a single substrate pass.
A method for pattern transfer, comprising:
A lithographic apparatus, comprising:
A device manufacturing method, comprising:
A carrier medium carrying computer readable instructions arranged to cause a lithographic apparatus to carry out a method comprising:
Dependencies are inferred from the claim text.