Exposure apparatus, exposure method and device manufacturing method

An exposure apparatus that exposes a substrate, the exposure apparatus comprising:

• a first moving apparatus that moves a first pattern in a prescribed scanning direction;
• a second moving apparatus that moves a second pattern in the prescribed scanning direction;
• a third moving apparatus that moves a third pattern in the prescribed scanning direction;
• a substrate moving apparatus that moves a substrate having a plurality of shot regions in the prescribed scanning direction to a first exposure region to which a first exposure light from the first pattern is irradiated, to a second exposure region to which a second exposure light from the second pattern is irradiated, and to a third exposure region to which a third exposure light from the third pattern is irradiated;
• and
• a controller that controls the first moving apparatus, the second moving apparatus, the third moving apparatus and the substrate moving apparatus so that:
• (1) when the substrate is moving in one direction, a preparatory operation is performed for moving the second pattern in a prescribed direction to expose a second shot region on the substrate using the second exposure light irradiated to the second exposure region, and for moving the third pattern in the prescribed direction to expose a third shot region on the substrate using the third exposure light irradiated to the third exposure region while moving the first pattern in the prescribed direction to expose a first shot region on the substrate using the first exposure light irradiated to the first exposure region, and (2) a preparatory operation is performed for moving the first pattern in a direction that is the reverse of the prescribed direction to expose a fourth shot region on the substrate using the first exposure light irradiated to the first exposure region after an exposure for the first shot region using the first exposure light irradiated to the first exposure region and then (3) moving the first pattern in the prescribed direction to expose a fourth shot region on the substrate using the first exposure light irradiated to the first exposure region.

An exposure method that exposes a substrate, the method comprising:

• synchronously with movement of the substrate in one direction, moving a first pattern in a prescribed direction with respect to a first exposure light to expose a first shot region on the substrate using the first exposure light from the first pattern, and then while continuing movement of the substrate in the one direction, moving a second pattern in a specified direction to expose a second shot region on the substrate, which is adjacent to the first shot region, using a second exposure light from the second pattern;
• then reversing the respective movement directions of the substrate and the second pattern so as to move in reverse directions, and synchronously moving the substrate in the reverse direction while moving the second pattern in the reverse direction to expose a third shot region on the substrate using the second exposure light from the second pattern;
• and
• continuing movement of the substrate in the reverse direction consecutively with exposure of the third shot region while moving the first pattern in the same direction as the movement direction of the second pattern during exposure of the third shot region to expose a fourth shot region on the substrate, which is adjacent to the third shot region, using the first exposure light from the first pattern.