Exposure Method, Exposure Apparatus and Method for Fabricating Device
OwnerKenichi Shiraishiinventor
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Abstract
An exposure condition is determined in accordance with a moving condition of a substrate (P) relative to a projection optical system so that a pattern image is projected on the substrate (P) in a desired projection state, and the substrate (P) is exposed in the determined exposure condition.
Claims26
An exposure method for exposing a substrate by filling liquid in a light path space formed between a projection optical system and the substrate and projecting a pattern image on the substrate through the projection optical system and the liquid, comprising:
- determining an exposure condition in accordance with a moving condition of the substrate relative to the projection optical system so that the pattern image is projected on the substrate in a desired projection state;
- and
- exposing the substrate in the determined exposure condition.
An exposure apparatus for exposing a substrate by filling liquid in a light path space formed between a projection optical system and the substrate and projecting a pattern image on the substrate through the projection optical system and the liquid, comprising:
- a movable member capable of holding and moving the substrate at an image plane side of the projection optical system;
- and
- a storage device that pre-stores an exposure condition for projecting the pattern image on the substrate in a desired projection state in accordance with a moving condition of the substrate relative to the projection optical system.
A device fabricating method comprising:
- providing an exposure apparatus for exposing a substrate by filling liquid in a light path space formed between a projection optical system and the substrate and projecting a pattern image on the substrate through the projection optical system and the liquid,
- the exposure apparatus including a movable member capable of holding and moving the substrate at an image plane side of the projection optical system, and a storage device that pre-stores an exposure condition for projecting the pattern image on the substrate in a desired projection state in accordance with a moving condition of the substrate relative to the projection optical system;
- and
- exposing the substrate with the exposure apparatus.
Dependencies are inferred from the claim text.