Junction field-effect transistor
OwnerKazuhiro Fujikawa, Shin Haradainventors
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Abstract
A junction field-effect transistor comprises an n-type semiconductor layer having a channel region, a buffer layer formed on the channel region and a p+ region formed on the buffer layer. The concentration of electrons in the buffer layer is lower than the concentration of electrons in the semiconductor layer. The concentration of electrons in the buffer layer is preferably not more than one tenth of the concentration of electrons in the semiconductor layer. Thus, the threshold voltage can be easily controlled, and saturation current density of a channel can be easily controlled.
Claims9
A junction field-effect transistor comprising:
- a first conductivity type semiconductor layer having a channel region;
- a buffer layer, formed on said channel region;
- and
- a second conductivity type doped region formed on said buffer layer, wherein
- a first conductivity type carrier concentration in said buffer layer is lower than a first conductivity type carrier concentration in said first conductivity type semiconductor layer.
Dependencies are inferred from the claim text.