Chip For Cell Electrophysiological Sensor, Cell Electrophysiological Sensor Using The Same, and Manufacturing Method of Chip for Cell Electrophysiological Sensor

A manufacturing method of chip for cell electrophysiological sensor comprising:

• a step of forming a recess at the first side of the substrate by dry etching,
• a step of forming a through-hole penetrating from the recess to the second side of the substrate by dry etching,
• a step of heating the substrate in decompressed rare gas, hydrogen gas, or nitrogen gas atmosphere, and
• a step of forming curved surfaces curved from the first side of the substrate to the inner wall of the opening of the recess, from the inner wall of the recess to the inner wall of the opening of the through-hole, and from the inner wall of the through-hole to the second side of the substrate.

A manufacturing method of chip for cell electrophysiological sensor comprising:

• a step of forming a recess at the first side of the substrate by dry etching,
• a step of forming a through-hole penetrating from the recess to the second side of the substrate by dry etching,
• a step of forming films from first side and second side of the substrate by vapor phase method,
• a step of heating the substrate in decompressed rare gas, hydrogen gas, or nitrogen gas atmosphere, and
• a step of forming curved surfaces curved from the first side of the substrate to the inner wall of the opening of the recess, from the inner wall of the recess to the inner wall of the opening of the through-hole, and from the inner wall of the through-hole to the second side of the substrate.