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US 2009/0151756 A1Published application
Liquid treating apparatus
AssigneeTokyo Electron Limited
InventorYuji Kamikawa
Life of this patent
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Abstract
A liquid treating apparatus comprising a holding device (30) for holding wafers (W) in a substantially vertical attitude and a treating vessel (10) for accommodating the wafers held by the holding device. A treating liquid is supplied into the treating vessel by means of a treating liquid supply system. A rotational drive device (20) is provided for rotating the holding device (30) around a rotational axis passing approximately through the center of the wafers (W) in a state of non-contact with the treating vessel (10).
Claims13
A liquid treating apparatus comprising:
- holding means for holding a generally flat plate-like workpiece in a substantially vertical attitude;
- a treating vessel for accommodating the workpiece held by said holding means;
- a treating liquid supply system for supplying a treating liquid to the workpiece accommodated in said treating vessel;
- and
- rotational drive means for rotating said holding means around a rotational axis passing approximately through the center of the workpiece in a state of non-contact with the treating vessel and the rotational drive means.
2 more elements
Dependencies are inferred from the claim text.