Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer

A system configured to determine a model for predicting printability of reticle features on a wafer, comprising:

• a simulation engine configured to generate simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions;
• and
• a computer system configured to:
• determine one or more characteristics of the reticle features of the simulated images;
• compare the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process;
• and
• select one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparison.

A computer-readable medium, comprising program instructions executable on a computer system for performing a computer-implemented method for determining a model for predicting printability of reticle features on a wafer, wherein the computer-implemented method comprises:

• generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions;
• determining one or more characteristics of the reticle features of the simulated images;
• comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process;
• and selecting one of the different generated models as the model to be used for
• predicting the printability of the reticle features based on results of the comparing step.