Protective inserts to line holes in parts for semiconductor process equipment
AssigneeASM International N.V.
InventorsVladimir Kuznetsov, Ernst H.A. Granneman
Life of this patent
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Abstract
Inserts are used to line openings in parts that form a semiconductor processing reactor. In some embodiments, the reactor parts delimit a reaction chamber. The reactor parts may be formed of graphite. A layer of silicon carbide is deposited on surfaces of the openings in the reactor parts and the inserts are placed in the openings. The inserts are provided with a hole, which can accept another reactor part such as a thermocouple. The insert protects the walls of the opening from abrasion caused by insertion of the other reactor part into the opening.
Claims29
A method for fabricating a semiconductor processing reactor part, comprising:
- providing a partially-fabricated reactor part having an opening on a surface of the partially-fabricated reactor part;
- depositing a protective coating on a surface of the opening;
- and
- subsequently placing an insert into the opening, the insert having cavity extending along a length of the insert.
A method for making a part for a semiconductor processing reactor, comprising:
- providing a first semiconductor reactor part, the reactor part having a hole;
- placing an insert into the hole;
- and
- inserting a second semiconductor reactor part into an opening in the insert.
A semiconductor processing reactor part for defining a reaction chamber for processing a semiconductor substrate, the reactor part comprising:
- a surface configured to delimit at least part of the reaction chamber;
- and
- a protective insert disposed within the reactor part, wherein the protective insert does not extend beyond the surface, wherein a wall of the protective insert defines a cavity extending along at least part of a length of the protective insert, wherein the wall has a thickness of about 0.05 mm or more.
Dependencies are inferred from the claim text.