Method of forming inorganic insulating layer and method of fabricating array substrate for display device using the same
AssigneeLG Display Co., Ltd.
InventorsJoo-Soo Lim, Hong-Sik Kim, Hee-Young Kwack, Hyun-Seok Hong, Byung-Chul Ahn, Byoung-Ho Lim
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Abstract
A method of forming an inorganic insulating layer on a substrate comprises supplying a mixed gas between the substrate and a target, and generating a plasma between the substrate and the target. The target comprises a silicon-based material. The method further comprises depositing a plurality of ions from the plasma on the substrate.
Claims28
A method of forming an inorganic insulating layer on a substrate, the method comprising:
- supplying a mixed gas between the substrate and a target;
- generating a plasma between the substrate and the target, wherein the target comprises a silicon-based material;
- and
- depositing a plurality of ions from the plasma on the substrate.
A method of forming a passive pattern on a substrate, the method comprising:
- forming an active layer, a data line, a source electrode and a drain electrode on the substrate, the active layer disposed over the gate electrode, and the source and drain electrodes spaced apart from each other to expose the active layer;
- forming a passivation layer on the substrate by sputtering under a temperature of about 24° C. to about 250° C.;
- and
- forming a passivation pattern on the active layer between the source electrode and the drain electrode from the passivation layer.
A method of forming a substrate that has a passivation pattern, the method comprising:
- forming a gate line and a gate electrode connected to the gate line on a substrate;
- forming a gate insulating layer on the gate line and the gate electrode;
- forming an active layer, a data line, a source electrode and a drain electrode on the gate insulating layer, the active layer disposed over the gate electrode, and the source and drain electrodes spaced apart from each other to expose the active layer;
- forming a pixel electrode that contacts the drain electrode and a connection electrode that connects the data line and the source electrode;
- and
- forming a passivation pattern, which includes an inorganic insulating layer, on the active layer between the source and drain region by sputtering.
Dependencies are inferred from the claim text.