Lithography track systems and methods for electronic device manufacturing
AssigneeApplied Materials, Inc.
InventorMichael C. Smayling
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Abstract
The present invention provides systems, methods, and apparatus for processing a lot of substrates in a lithography track system with an integrate metrology sensor. The invention includes performing a coating process on substrates; transferring the substrates to a stepper for alignment and exposure; transferring the substrates to a post-exposure bake chamber for bake; and performing metrology on the substrates in the lithography track system. The invention may further include automatically reworking substrates in an integrated rework chamber within the lithography track system. Numerous other aspects are provided.
Claims20
A system comprising:
- a lithography track adapted to process a substrate;
- and
- an integrated metrology sensor disposed within the lithography track.
A lithography track comprising:
- a coating chamber;
- a post-exposure bake chamber adjacent the coating chamber;
- and
- an integrated metrology sensor disposed within the lithography track.
A method of processing a lot of substrates in a lithography track system, the method comprising:
- performing a coating process on a substrate;
- transferring the substrate to a stepper for alignment and exposure;
- transferring the substrate to a post-exposure bake chamber for bake;
- and
- performing metrology on the substrate in the lithography track system.
Dependencies are inferred from the claim text.