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US 2009/0023082 A1Published application
Pellicle frame
AssigneeShin-Etsu Chemical Co., Ltd.
InventorToru Shirasaki
Life of this patent
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Abstract
The present invention is directed to provide a pellicle frame that causes little harm to the flatness of a photomask, even in the case where a pellicle is affixed after completion of the photomask.
Claims2
A pellicle used in semiconductor lithography, characterized in that a pellicle frame is made of a material having a Young's modulus of at least 100 GPa.
Dependencies are inferred from the claim text.