System and method for micro-electromechanical operation of an interferometric modulator
AssigneeIdc, LLC
InventorsClarence Chui, William J. Cummings, Brian J. Gally, Ming-Hau Tung
Life of this patent
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Abstract
An interferometric modulator is formed by a stationary layer and a mirror facing the stationary layer. The mirror is movable between the undriven and driven positions. Landing pads, bumps or spring clips are formed on at least one of the stationary layer and the mirror. The landing pads, bumps or spring clips can prevent the stationary layer and the mirror from contacting each other when the mirror is in the driven position. The spring clips exert force on the mirror toward the undriven position when the mirror is in the driven position and in contact with the spring clips.
Claims30
A method of making a microelectromechanical system (MEMS) device, comprising:
- forming a first electrode;
- depositing a dielectric material over at least a portion of the first electrode;
- removing a portion of the dielectric material from over the first electrode, thereby forming a variable thickness dielectric layer;
- and
- forming a second electrode over at least a portion of the variable thickness dielectric layer.
A method of making an interferometric modulator, comprising:
- forming a first electrode;
- depositing a dielectric layer over at least a portion of the first electrode;
- removing a portion of the dielectric layer to form a variable thickness dielectric layer;
- depositing a sacrificial layer over the variable thickness dielectric layer;
- planarizing the sacrificial layer;
- and
- forming a second electrode over the sacrificial layer.
A method of making an interferometric modulator, comprising:
- forming a first electrode;
- depositing a dielectric layer over at least a portion of the first electrode;
- removing a portion of the dielectric layer to form a variable thickness dielectric layer;
- depositing a sacrificial layer over the a variable thickness dielectric layer;
- depositing a planarization layer over the sacrificial layer;
- and
- forming a second electrode over the planarization layer.
Dependencies are inferred from the claim text.