Optical Imaging Device Having At Least One System Diaphragm
AssigneeCarl Zeiss SMT GmbH
InventorsBernhard Gellrich, Thomas Bischoff, Hermann Bieg, Martin Huber, Francois Henzelin, Gerhard Szekely, Uy-Liem Nguyen, Martin E. Humphries
Life of this patent
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Abstract
An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.
Claims30
1-21. (canceled)
An optical imaging device, in particular an objective for semiconductor lithography, having at least one system diaphragm, the system diaphragm comprising a multiplicity of mobile plates which are rotatably mounted, wherein the plates have a spherical curvature.
A variable system diaphragm for a microlithographic projection exposure apparatus having a multiplicity of plates held in a mobile fashion by means of solid state articulations.
A variable system diaphragm having a multiplicity of mobile plates, the plates having a spherical curvature and being rotationally mounted, rotational bearing axes of the plates being aligned with a center of curvature (C) of a sphere, and the sphere determining a surface on which the plates are mobile relative to one another.
A projection objective in semiconductor lithography having optical elements, at least one variable system diaphragm for a microlithographic projection exposure apparatus being provided for introduction into a concave surface of an optical element, the diaphragm following a curved surface.
Dependencies are inferred from the claim text.