Loading patent…
AssigneeCarl Zeiss SMT GmbH
InventorsJohannes Zellner, Hans-Juergen Mann
Estimating the term…
The disclosure relates an illumination system configured to guide illumination light from a radiation source to an object plane and to provide defined illumination of an object field in the object plane, wherein illumination light is supplied to the object field by a bundle-guiding optical pupil component which is disposed in a pupil plane of the projection objective, and wherein at least another bundle-guiding component is disposed upstream of the pupil component in the beam path of the illumination light. The disclosure further concerns a projection exposure apparatus that includes such an illumination system of this type, a method of fabricating a microstructured component using such a projection exposure apparatus, and a microstructured component fabricated using such a method.
An illumination system configured to guide radiation to an object plane to illuminate an object field in the object plane, the illumination system comprising:
An apparatus, comprising:
An apparatus, comprising:
Dependencies are inferred from the claim text.