Exposure apparatus, exposure method, and method for producing device
AssigneeNikon Corporation
InventorHiroyuki Nagasaka
Life of this patent
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Abstract
An exposure apparatus fills an optical path space on a side of an image plane of a projection optical system with liquid and exposes a substrate via the projection optical system and the liquid. The exposure apparatus has a measurement unit which measures an optical property of the liquid. According to the measurement result, it is possible to adjust the optical characteristic of the liquid by a liquid mixing unit. Thus, it is possible to maintain the exposure accuracy at a desired state when performing immersion exposure.
Claims65
An exposure apparatus which exposes a substrate through a liquid, comprising:
- a projection optical system;
- and
- a measuring device which measures optical property of the liquid.
An exposure apparatus which exposes a substrate through a liquid, comprising:
- a projection optical system;
- a liquid supply mechanism which supplies the liquid to a side of an image plane of the projection optical system;
- and
- a mixing device which is provided in the liquid supply mechanism and mixes a plurality of liquids,
- wherein the liquid supply mechanism supplies the liquid mixed by the mixing device.
An exposure method for exposing a substrate with an image of a predetermined pattern through a liquid, comprising:
- measuring optical property of the liquid before supplying the liquid to an area in which the image of the predetermined pattern is formed;
- adjusting exposure conditions;
- and
- exposing the substrate with the image of the predetermined pattern through the liquid.
An exposure method for exposing a substrate with an image of a predetermined pattern through a liquid, comprising:
- mixing a plurality of liquids;
- measuring optical property of the liquid before or after the mixing of the plurality of liquids;
- and
- exposing the substrate through the liquid which has been mixed.
An exposure method for exposing a substrate with an image of a predetermined pattern through a liquid, comprising:
- mixing a plurality of liquids;
- adjusting an image formation characteristic of the image of the predetermined pattern so that a desired image of the predetermined pattern is obtained;
- and
- exposing the substrate through the liquid has been mixed.
An exposure apparatus comprising:
- a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical system and the plate;
- and
- a measuring apparatus for measuring a refractive index of the liquid,
- wherein said measuring apparatus includes:
- a cell for accommodating the liquid and transmitting a light;
- and
- a detector for detecting an incident position of the light refracted by the liquid in the cell.
Dependencies are inferred from the claim text.