Cleaning apparatus and method, exposure apparatus having the cleaning apparatus, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorHiroshi Osawa
Life of this patent
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Abstract
A cleaning apparatus includes an irradiation unit configured to irradiate onto a substrate a laser beam having a pulse width of a picosecond-level or femtosecond-level range, and to clean the substrate via the laser beam.
Claims18
A cleaning apparatus comprising an irradiation unit configured to irradiate onto a substrate a laser beam having a pulse width of a picosecond-level or femtosecond-level range, and to clean the substrate via the laser beam.
A cleaning method for cleansing a substrate by irradiating onto a substrate a laser beam having a pulse width of a picosecond-level or femtosecond-level range, said cleaning method comprising the step of setting the number of pulses of the laser beam irradiated onto the substrate such that an irradiation time can be equal to and greater than and closest to release time necessary for a particle that has adhered to the substrate to release from the substrate.
A cleaning method for cleaning a substrate by irradiating onto the substrate a laser beam that have a pulse width of a picosecond-level or femtosecond-level range.
Dependencies are inferred from the claim text.